WebMar 3, 2024 · In the system r-HiPIMS + ECWR, an additional plasma source based on special modification of inductively coupled plasma, which works with an electron cyclotron wave resonance ECWR, was used for further enhancement of plasma density ne and electron temperature Te at the substrate during the reactive sputtering deposition process. WebDec 28, 2024 · Reactive magnetron sputtering is a well-established physical vapor technique to deposit thin compound films on different substrates, ranging from insulating glass windows over wear-resistant car...
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WebDec 21, 2024 · High-power impulse magnetron sputtering (HiPIMS) provides high power densities in pulses with a low duty cycle [ 25, 26] on a magnetron sputtering source cathode, which enables high-density plasma waves and fluxes of ionized sputtered source materials. WebJan 18, 2024 · 台灣時間: 1月22日 下午3點-4點. Unique process control with PLASUS systems: Simultaneous adjustment of ionization and stoichiometry in reactive HIPIMS processes – Thomas Schütte, PLASUS. PLASUS 系統獨特的製程控制:反應性 HIPIMS 製程中游離化和化學計量測量的同時調整 new life at hocutt church burlington nc
Room temperature deposition of homogeneous, highly …
Websputtering (HiPIMS). Reactive co-deposition from Ta (HiPIMS mode) and Si (DC magnetron sputtering mode) targets yielded a gradient in the Ta:Si ratio across a 4-inch substrate ranging the Si incorporation from 2 to 9.5%. The films were deposited on SiO 2/Si substrate with platinum electrodes patterned on it. The switching characteristics, film WebJan 26, 2024 · In this work, we report on the oblique-angle deposition of highly c-axis oriented AlN (0002) films, enabled by reactive metal-ion syn-chronized HiPIMS. The effect of critical deposition... WebOct 15, 2013 · HiPIMS, HiPIMS + MF and MF asymmetric bipolar magnetron plasma sources were investigated as tools for the deposition of rutile TiO 2 films without external … intolerance of wheat bran